Landolt-Börnstein - Group III Condensed Matter

7.3 Methods of diffusion investigations on amorphous alloys

Abstract

This chapter describes the various methods of diffusion investigations on amorphous alloys. Conventional methods like mechanical sectioning are not adequate to measure steep diffusion profiles. The sectioning is too coarse for profiles measurable in amorphous alloys. A combination of the radiotracer technique with ion-beam-sputtering has been successfully applied in many experiments to measure the diffusion coefficients in amorphous alloys directly. In a number of experiments, secondary-ion-mass spectroscopy (SIMS) has been used for the direct measurement of the diffusion profiles. Gaussian profile and SIMS profiles are shown in figures. Auger-electron spectroscopy (AES) is usually applied in combination with ion-beam sputtering. The profile in an amorphous alloy measured by the AES method is figured out. Rutherford backscattering (RBS) of He+ has been used in cases where the diffusion of heavy atoms in amorphous alloys of lighter atoms was investigated. Nuclear reaction methods have been used to measure the boron diffusion for instance, which is very difficult to measure with the direct methods. X-ray scattering methods have been applied in several studies to measure the interdiffusion coefficient of compositionally modulated multilayer thin films of amorphous or crystalline materials. Crystallization investigations, in particular primary crystallization applying transmission electron microscopy (TEM), have been used to measure diffusion coefficients as well.

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Title
7.3 Methods of diffusion investigations on amorphous alloys
Book Title
Diffusion in Solid Metals and Alloys
In
7 Diffusion in amorphous alloys
Book DOI
10.1007/b37801
Chapter DOI
10.1007/10390457_79
Part of
Landolt-Börnstein - Group III Condensed Matter
Volume
26
Editors
  • H. Mehrer
  • Authors
  • J. Horváth
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